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Electrical properties of VOx bolometer thin films prepared by metal-organic decomposition

机译:VO X / INM>金属有机分解制备的薄膜的电气计

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Well axis-oriented V2O5 thin films were fabricated by MOD. V2O5 films were reduced to VOx films under a temperature of 530°C and pressures of 1.2–3.0 Pa in O2. VOx films indicated an abrupt transition around 55°C with a resistivity change of 3 orders and TCR of 2.1–2.2 %/K at 300 K.
机译:轴向轴取向V 2 O 5 MOD制造薄膜。 V 2 O 5 薄膜在530°C的温度下减少到VO x 膜,在O 2 。 VO x 薄膜指示突然的55℃突然过渡,电阻率变化为3个订单,TCR为2.1-2.2%/ k,300 k。

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