Patterned InGaAs/InGaAsP/InP quantum dot active lasers using diblock copolymer lithography and selective area MOCVD growth

摘要

Diblock copolymer nanopatterning and selective growth is implemented for realizing quantum dot active region lasers on InP substrates. The quantum dot active region is found to be sensitive to the temperature ramping prior to the cladding layer regrowth.