首页> 外文会议>Nuclear plant chemistry conference >DEVELOPMENT OF A SUPPRESSION METHOD FOR DEPOSITION OF RADIOACTIVE COBALT AFTER CHEMICAL DECONTAMINATION: ENHANCEMENT OF SUPPRESSION PERFORMANCE FOR FERRITE FILM COATING
【24h】

DEVELOPMENT OF A SUPPRESSION METHOD FOR DEPOSITION OF RADIOACTIVE COBALT AFTER CHEMICAL DECONTAMINATION: ENHANCEMENT OF SUPPRESSION PERFORMANCE FOR FERRITE FILM COATING

机译:化学净化后放射性钴沉积抑制法的抑制方法:用于铁氧体薄膜涂层抑制性能的增强

获取原文

摘要

For the last decade, chemical decontamination at the beginning of periodical inspection has been applied to many Japanese BWR plants in order to reduce radiation exposure. However, following the chemical decontamination, a rapid dose rate increase can be seen in some plants after just a few operation cycles. In the chemical decontamination, the oxides that incorporate ~(60)Co are dissolved with reductive and oxidative chemical reagents. Therefore, some base metal of the piping appears on the surface after the decontamination. The oxide film growth rate of the piping during plant operation just after the decontamination is higher than that just before it. In addition, the concentration of radioactivity in reactor water of old plants is higher than that of new plants. Therefore, there is a possibility that the deposition amount of radioactivity on the piping when beginning an operating cycle of a just-decontaminated plant is higher than that just before the decontamination. Our objective was development of a more effective method to reduce the recontamination after the chemical decontamination. In the developed suppression method, called the Hitachi Ferrite Coat (Hi-F Coat) process, a fine ferrite coating film is formed on the base metal of the piping following the chemical decontamination. For the Hi-F Coat process, laboratory experiments confirmed a °Co deposition reduction effect of 1/3 compared to non-coated specimens. The film structure of the ferrite coating was kept after soaking in high temperature water to simulate BWR conditions. The corrosion amount of the ferrite film-coated specimen was suppressed to about half that of a polished specimen. This ferrite film blocked diffusion of oxidants in the reactor water to the base metal and metal ions in the oxide film to the reactor water. However, the ferrite film incorporated a few dissolved °Co ions, because ferrous ions in the ferrite film were exchangeable with ~(60)Co ions in the simulated BWR condition water. In order to prevent the ~(60)Co ion incorporation into the ferrite film, we investigated two procedures to be combined with the Hi-F Coat process. First the prevention effect with pre-oxidation under the normal water chemistry condition for Hi-F Coat process specimens was investigated. These laboratory experiments confirmed a ~(60)Co deposition reduction effect of 1/10 compared to polished specimens. Secondly, the prevention effect of the Co ion incorporation was investigated when zinc ions were injected into the high temperature water. These laboratory experiments confirmed a ~(60)Co deposition reduction effect of 1/6 compared to non-coated specimens without zinc ion injection.
机译:在过去的十年中,期刊检查开始时的化学净化已应用于许多日本BWR植物以减少辐射暴露。然而,在化学净化后,在一些操作周期之后,在一些植物中可以看到快速剂量率增加。在化学净化中,掺入〜(60)Co的氧化物溶解在还原和氧化化学试剂中。因此,在去污后,管道的一些基础金属出现在表面上。在净化后的植物操作期间管道在植物操作期间的氧化膜生长速率高于此前。此外,旧植物反应器水中放射性浓度高于新植物的放射性。因此,在开始刚污染的植物的操作循环时,管道上的放射性的沉积量的可能性高于脱块净化的操作循环。我们的目的是在化学净化后开发更有效的方法,以减少再污染后的再污染。在所发育的抑制方法中,称为Hitachi铁氧体涂层(Hi-F涂层)工艺,在化学净化后在管道的基础金属上形成细铁素体涂膜。对于Hi-F涂层工艺,实验室实验证实了与未涂覆的标本相比1/3的°CO沉积降低效果。在高温水中浸泡以模拟BWR条件后,保持铁氧体涂层的薄膜结构。铁氧体薄膜涂层标本的腐蚀量抑制至抛光样品的约一半。该铁氧体薄膜阻止了反应器水中的氧化剂的扩散到氧化物膜中的基础金属和金属离子中的反应器水。然而,铁氧体薄膜掺入了几种溶解°Co离子,因为铁氧体膜中的铁离子在模拟BWR条件水中可与〜(60)的CO离子中可交换。为了防止〜(60)将Co离子掺入到铁氧体薄膜中,我们研究了两种方法与Hi-F涂层工艺相结合。首先,研究了在正常水化学条件下采用预氧化的预防效果进行高级涂层工艺标本。这些实验室实验证实了与抛光标本相比1/10的〜(60)CO沉积减少效果。其次,当将锌离子注入高温水中时,研究了CO离子掺入的预防效果。这些实验室实验证实了与没有锌离子注射的非涂层标本相比,1/6的CO沉积降低效果。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号