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EFM STUDY OF THE INFLUENCE OF HUMIDITY ON CHARGE INJECTION AND CHARGE RELAXATION IN SILICON NITRIDE USED IN ELECTROSTATICALLY ACTUATED MEMS

机译:EFM对静电MEMS中使用氮化硅电荷注射和电荷弛豫的影响研究

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In this work, spots of charges have been injected on typical silicon nitride used for RF-MEMS switches. Several relative humidity (RH) conditions have been used for the charge injections. The evolution of these spots with time has been assessed thanks to electrostatic force microscopy (EFM) measurements. Experimental results confirm the hypothesis of surface conduction enhancement but also show a 30% increase of the density of injected charge by humidity. It has been also shown that a level of 40% RH decreases the charge relaxation time by a factor 10 to more than 100 compared to a charge relaxation process occurring under dry atmosphere. This phenomenon may be due to the ability of protons contained in the water to diffuse trough silicon nitride.
机译:在这项工作中,对用于RF-MEMS开关的典型氮化物注入电荷斑点。几种相对湿度(RH)条件已经用于电荷注入。由于静电力显微镜(EFM)测量,已经评估了这些斑点随时间的演变。实验结果证实了表面传导增强的假设,但还显示了湿度注射电荷密度增加30%。还表明,与在干燥气氛下发生的电荷松弛过程相比,40%RH的水平将电荷弛豫时间减少10至100多个以上。这种现象可能是由于水中包含在水中以扩散槽氮化硅的能力的能力。

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