First Observation of 0.1μm Size COPs and Dusts on the Bare Si Wafers by Using AFM with Optical Scattering System

摘要

We have developed a new technique by using optical scattering phenomenon to link the coordinates of the commercially available wafer inspection system to the analyzer one with high precision of ±0.1μm. In this paper, we will report on the results about the first observation of 0.1μm-size particles such as dusts and crystal originated particles (COPs) on Si wafers by using the atomic force microscope(AFM) combined with this new technique.