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Comparison of static contact angle change and relaxation in EWOD devices

机译:EWOD器件中静电​​接触角变化和放松的比较

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In conventional Electrowetting on Dielectric (EWOD) devices a static change of the contact angle is observed when a voltage is applied to the electrodes, usually correlated to the Lippmann equation. In this paper we analyze the contact angle changes by using two different dielectrics of different materials and thicknesses and also comparing two different ways of creating the field singularity at the contact line. Although it is known that the contact design may induce a tangential electric field and a spontaneous front wetting, we have observed in our devices that the change in the contact line is still due to the interfacial changing at the air-liquid interface. Several devices were fabricated using Teflon and PDMS coating on top of pyrex wafer and silicon wafer previously oxidized. The results obtained using these devices were compared to a conventional EWOD sample having PDMS deposited on top of metal electrodes previously laid out on top of pyrex wafer. We have compared the static contact angle change, produced using conventional voltage drive source, with a similar measurement after charges were generated in the gas phase. We have observed quite different behaviour of the two films used as coatings, for similar charge densities created, the contact angle on Teflon samples changed much less than in the PDMS samples.
机译:在介电(EWOD)装置上的传统电润湿器中,当将电压施加到电极时,观察到接触角的静态变化,通常与Lippmann等式相关。在本文中,我们通过使用不同材料和厚度的两个不同电介质来分析接触角变化,并且还比较了在接触线上产生场奇异性的两种不同方式。虽然已知接触设计可以诱导切向电场和自发的前润湿,但是在我们的装置中观察到接触线的变化仍然是由于在空气液体界面处的界面变化的影响。使用先前氧化的Pyrex晶片和硅晶片顶部的Teflon和PDMS涂层制造了几种器件。将使用这些装置获得的结果与常规的EWOD样品进行比较,该样品具有沉积在预先布置在Pyrex晶片顶部的金属电极顶部的PDMS。我们已经比较了使用常规电压驱动源产生的静电接触角变化,在气相中产生电荷后的类似测量。我们已经观察到用作涂层的两部胶片的相当不同的行为,对于产生类似的电荷密度,Teflon样品上的接触角变化得比在PDMS样品中的少于少于。

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