mpirical study of OPC metrology requirements for 32-nm node logic

摘要

We evaluate the relationship between the number of measurements used to create each data point in an OPC model dataset and resulting model quality for target 32-nm logic node applications. Generated data sets will range from single-measurement, unfiltered data sets to many-measurement averages based on filtered results. Intermediate measurement-count averages will also be evaluated in an attempt to quantify the tradeoff between raw measurements per data pointand resulting model quality. Finally, other variations will also be considered, such as automated versus manual datafiltering. The auto-fitted OPC models will be compared to identify metrology recommendations for 32-nm logic nodemodeling.