International photomask linewidth comparison by NIST and PTB

摘要

In preparation of the international Nanol linewidth comparison on photomasks between 9 national metrology institutes,NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nanol comparisonin order to test the suitability of the mask standards and the general approach to be used for the Nanol comparison. Thiscontribution describes the rationale of both comparisons, the design of the mask comparison standards to be used and themeasurement methods applied for traceable photomask linewidth metrology at NIST and PTB.