(NanomaterialsBook)GROWTH OF NANOCRYSTALLINE DIAMOND THIN FILMS ON TITANIUM SILICON CARBIDE USING DIIFERENT CHEMICAL VAPOR DEPOSITION PROCESSES

摘要

Diamond deposition on Ti3SiC2, a newly developed metallic ceramic material, was studied usingmicrowave plasma enhanced chemical vapor deposition (MWCVD) and hot filament chemical vapordeposition (HFCVD) in hydrogen and methane gas mixtures under different conditions. Scanning electronmicroscopy (SEM), atomic force microscopy (AFM), Raman spectroscopy and synchrotron near edgeextended X-ray absorption fine structure spectroscopy (NEXAFS) were used to characterize thesynthesized films. Results show that due to the high diamond nucleation density, nanocrystalline diamond(NCD) thin films can be feasibly synthesized on Ti_3SiC_2 under typical microcrystalline diamond growthconditions..