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Some techniques to characterize multilayers and their interfaces

机译:一些特征是多层和界面的技术

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We describe some destructive and non-destructive techniques that can be useful to examine multilayers and particularly their interfaces. The presented non-destructive techniques allow obtaining the electron structure of the sample and then determine the chemical states of the elements in the multilayer from the analysis of the occupied (x-ray emission and photoemission spectroscopies) or unoccupied (x-ray absorption or electron energy loss spectroscopies) states. Among the destructive techniques we introduce secondary ion mass spectrometry and transmission electron microscopy that bring some information about the structural quality of the samples.
机译:我们描述了一些有用的破坏性和非破坏性的技术,可用于检查多层,特别是它们的界面。所提出的非破坏性技术允许获得样品的电子结构,然后从占用(X射线发射和光学激光谱)或未占用(X射线吸收或电子)的分析中确定多层元素的化学状态能量损失光谱)状态。在破坏性技术中,我们引入二次离子质谱和透射电子显微镜,从而带来了一些关于样品结构质量的一些信息。

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