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Some techniques to characterize multilayers and their interfaces

机译:表征多层及其界面的一些技术

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We describe some destructive and non-destructive techniques that can be useful to examine multilayers and particularly their interfaces. The presented non-destructive techniques allow obtaining the electron structure of the sample and then determine the chemical states of the elements in the multilayer from the analysis of the occupied (x-ray emission and photoemission spectroscopies) or unoccupied (x-ray absorption or electron energy loss spectroscopies) states. Among the destructive techniques we introduce secondary ion mass spectrometry and transmission electron microscopy that bring some information about the structural quality of the samples.
机译:我们描述了一些破坏性和非破坏性技术,这些技术可用于检查多层,尤其是其界面。提出的非破坏性技术可以获取样品的电子结构,然后通过分析被占据的(X射线发射和光发射光谱)或未被占据的(X射线吸收或电子)来确定多层中元素的化学状态。能量损失光谱)状态。在破坏性技术中,我们引入了二次离子质谱和透射电子显微镜,这些技术带来了有关样品结构质量的一些信息。

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