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Structures and optical properties of indium doped SrTiO_3 thin films by oxygen plasma-assisted pulsed laser deposition

机译:氧等离子体辅助脉冲激光沉积的铟掺杂SRTIO_3薄膜的结构和光学性质

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Undoped and In-doped SrIn_xTi_(1-x)O_3(x=0, 0.1, 0.2) films have been deposited on Si(100) and quartz substrates by oxygen plasma-assisted pulsed laser deposition (PLD). Effects of indium doping on the crystallinity and the optical energy band gap of SrTiO_3 (STO) films were investigated. Results indicate that undoped STO film is of rather good crystallinity and low defects concentration. However indium doping deteriorates the crystallinity of the STO firm, and results in the roughening of the film surface. Moreover the a-axis length monotonically increases when increasing In content. For all the films, the average transmission in the visible wavelength region (λ=400-800nm) is over 75%. The optical energy band gap of STO thin films, measured from transmittance spectra, changes from 3.67eV to 3.93eV by indium doping.
机译:通过氧等离子体辅助脉冲激光沉积(PLD)沉积未掺杂的和掺杂的SRIN_XTI_(1-X)O_3(X = 0,0.1,0.2)膜沉积在Si(100)和石英基板上。研究了铟掺杂对SRTIO_3(STO)膜的结晶度和光能带隙的影响。结果表明,未掺杂的STO膜具有相当良好的结晶度和低缺陷浓度。然而,铟掺杂使STO坚固的结晶度劣化,并导致膜表面的粗糙化。此外,当内容的增加时,轴长单调增加。对于所有薄膜,可见波长区域(λ= 400-800nm)中的平均传输超过75%。由透射光谱测量的STO薄膜的光能带隙,通过铟掺杂从3.67EV变化到3.93ev。

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