Growth and Characterization of Li-doped ZnO thin films on nanocrystalline diamond substrates

摘要

Nanocrystalline diamond(NCD) films with a mean surface roughness of 23.8 nm were grown on silicon substrates in a hot filament chemical vapor deposition(HFCVD) system. Then,Zn_(1-x)Li_xO (x=0, 0.05, 0.10, 0.15) films were deposited on these NCD films by radio-frequency(RF) reactive magnetron sputtering method. When x was 0.1, the Li-doped ZnO film had a larger resistivity more than 10~8Ω·cm obtained from Hall effect measurement. All the Zn_(1-x)Li_xO films had a strong c-axis orientation structure determined by X-ray diffraction (XRD). The above results suggested that the Li-doped ZnO film/NCD structure prepared in this work was attractive for the application of high frequency surface acoustic wave (SAW) devices.