Microbial Distribution and Microbial Reductive Dechlorination Performance in the Immediate Vicinity of a NAPL Source Zone (Abstract)

摘要

Microbial reductive dechlorination has emerged as an attractive polishing technology for tetrachloroethene (PCE) and trichloroethene (TCE) DNAPL source zones following aggressive physicochemical treatments (e.g., surfactant flushing). The activity and distri- bution of relevant microbial species within DNAPL source zones, however, remain poorly understood. The primary objective of this research was to evaluate the activity and distribution of dechlorinating populations in the immediate vicinity of PCE-DNAPL source zones.