Novel Copper (I) and Silver (I) Complexes as Precursors for Chemical Vapor Deposition and Spin-Coating of Copper and Silver

摘要

A general synthesis methodology for an industrial scale preparation of novel copper(I) and silver(I) complexes of type [(~nBu_3P)_mMO_2CR] (1), [(~nBu_3P)_mMO_2CCO_2M(P~nBu_3)_m] (2), and [(~nBu_3P)_MO_2C-X-CO_2M(P~nBu_3)_m] (3) (m = 1, 2, 3; M = Cu, Ag; R = H, singly-bonded organic group; X = CH_2, CH_2CH_2, ...) is discussed. Temperature- programmed and in-situ mass-spectrometry and TG-MS measurements were used to study the gas phase and solid state behavior of these complexes. Possible decomposition mechanisms for 1 and 2 will be presented. The use of 1, 2 and 3 as CVD and Spin-on precursors for the deposition of copper and silver on glass and (patterned) TiN-coated oxidized silicon wafers is reported. For the characterization of the samples SEM, EDX, XPS, TEM and EELS were applied. Continuous and homogeneous metal layers were obtained.