首页> 外文会议>International Conference on Metallurgical Coatings and Thin Films >Surface evolution and dynamic scaling of heteroepitaxial growth of (La,Ba)MnO3 films on SrTiO3 substrates by rf magnetron sputtering
【24h】

Surface evolution and dynamic scaling of heteroepitaxial growth of (La,Ba)MnO3 films on SrTiO3 substrates by rf magnetron sputtering

机译:射频磁控溅射(RF磁控溅射SRTIO3衬底上(LA,BA)MNO3薄膜异质生长的表面演化和动态缩放

获取原文

摘要

We have investigated the evolution of (La0.7Ba0.3)MnO3 (LBMO) surfaces epitaxially grown on SrTiO3 (001) substrates using highresolution X-ray scattering and atomic force microscopy (AFM) measurements. At an early stage of growth, highly strained LBMO epilayers were formed and nearly pseudomorphic growth of LBMO epilayers on SrTiO3 substrates was expected. For these thin layers, roughness varied with thickness through a scaling exponent b =0.102T0.01. As the LBMO epilayer thickness attained 72 nm, the growth front of the film became quite rough, which is related to the relief of strain. From AFM images, distinct large 3-D islands were formed on the rough film surface in the regime of rapid roughening; this regime is described with a scaling exponent b =0.734T0.01. An effective critical thickness of a LBMO film epitaxially grown on a SrTiO3 substrate is experimentally determined to be about 50–72 nm.
机译:我们研究了(La0.7ba0.3)MnO3(LBMO)表面的演变,使用高次校正X射线散射和原子力显微镜(AFM)测量在SRTIO3(001)底物上外延生长的展开。在生长的早期阶段,预期形成高度应变的LBMO脱蛋白,并且在SRTIO3底物上的LBMO脱蛋白的几乎假晶生长。对于这些薄层,粗糙度通过缩放指数B = 0.102t0.01而变化。随着LBMO脱毛器厚度达到72nm,薄膜的生长变得相当粗糙,与菌株的缓解有关。从AFM图像中,在快速粗糙化的状态下,在粗糙的薄膜表面上形成不同的大3-D岛;使用缩放指数B = 0.734T0.01来描述该制度。在SRTIO3底物上外延生长的LBMO膜的有效临界厚度实验确定为约50-72nm。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号