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PVD-Al2O3-coated cemented carbide cutting tools

机译:PVD-AL2O3涂层硬质合金切割工具

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With the introduction of the bipolar pulsed dual magnetron sputtering (BP-DMS) technique, a wide range of opportunities has opened up for the deposition of insulating layers such as Al2O3 as well as of conductive compound layers such as TixAl1xN. In BP-DMS, two magnetrons in a pair alternately act as a cathode and an anode; during the cathode phase, the target is sputter-cleaned, hence ensuring a metallic surface during the anode phase and a stable long-term operation. At high-enough frequencies (25–50 kHz), possible electron charging of insulating layers will be suppressed and the otherwise troublesome phenomenon of arcing will be limited. The BP-DMS method has made it possible to deposit hard (N2000 HV) nanocrystalline g-Al2O3 textured in the [440] direction at substrate temperatures as low as 700 8C, which is a much lower temperature than the conventional chemical vapor deposition (CVD) temperatures (1000–1050 8C) for the deposition of the Al2O3 polymorphs a and n. In this paper, a study of the process, in terms of recording the process characteristic data and evaluating the influence of magnetic field, has been done. For a set of parameters, cemented carbide cutting inserts have been coated and tested. Inserts with a double layer of g-Al2O3 and TiAlN or TiN have been evaluated in cutting operations such as turning, threading, and end-milling, often with machining conditions (cutting data) more suitable for physical vapor deposition (PVD)- than CVD-coated tools. Some results are presented in this paper. It has been shown that the addition of a 2-Am-thick g-Al2O3 layer decreases the wear rate. The g-Al2O3/TiAlN (TiN)-coated inserts exhibit tool lives longer than the single-coated inserts especially at higher cutting speeds.
机译:随着双极脉冲双磁控溅射(BP-DMS)技术的引入,广泛的机会已经打开了沉积绝缘层,例如Al 2 O 3以及导电复合层,例如Tixal1xN。在BP-DMS中,一对中的两个磁控管交替用作阴极和阳极;在阴极阶段期间,目标是溅射清洁的,因此确保在阳极相期间的金属表面和稳定的长期操作。在高于足够高的频率(25-50 kHz)中,将抑制绝缘层的可能的电子充电,否则电弧曝光的其他麻烦现象将受到限制。 BP-DMS方法使得可以在低至700 8℃下在基板温度下织地织地(N2000HV)纳米晶G-AL2O3,其低至700℃,其温度远低于常规化学气相沉积(CVD )温度(1000-1050 8c),用于沉积Al2O3多晶型物A和N.本文在记录过程特征数据和评估磁场的影响方面,已经完成了对该过程的研究。对于一组参数,已经涂覆和测试了硬质合金切削刀片。在切割操作中的切割操作中,诸如转弯,螺纹和端铣的切割操作中,通常会评估具有双层的G-Al2O3和TiAln或TiN的插入件,通常具有更适合物理气相沉积(PVD)的加工条件(切割数据) - 而不是CVD - 涂层工具。本文提出了一些结果。已经表明,添加了2-AM厚的G-AL2O3层的添加降低了磨损率。 G-Al2O3 / TiAlN(锡)涂层涂覆的插入件展示刀具长于单涂层插入物,特别是在更高的切削速度下。

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