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PVD-Al2O3-coated cemented carbide cutting tools

机译:PVD-Al2O3涂层硬质合金刀具

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With the introduction of the bipolar pulsed dual magnetron sputtering (BP-DMS) technique, a wide range of opportunities has opened up for the deposition of insulating layers such as Al2O3 as well as of conductive compound layers such as TiAl1-xN. In BP-DMS, two magnetrons in a pair alternately act as a cathode and an anode; during the cathode phase, the target is sputter-cleaned, hence ensuring a metallic surface during the anode phase and a stable long-term operation. At high-enough frequencies (25-50 kHz), possible electron charging of insulating layers will be suppressed and the otherwise troublesome phenomenon of arcing will be limited. The BP-DMS method has made it possible to deposit hard (greater than or equal to2000 HV) nanocrystalline gamma-A(2)O(3) textured in the [440] direction at substrate temperatures as low as 700 degreesC, which is a much lower temperature than the conventional chemical vapor deposition (CVD) temperatures (1000-1050 degreesC) for the deposition of the Al2O3 polymorphs alpha and kappa.In this paper, a study of the process, in terms of recording the process characteristic data and evaluating the influence of magnetic field, has been done. For a set of parameters, cemented carbide cutting inserts have been coated and tested. Inserts with a double layer of gamma-Al2O3 and TiAIN or TiN have been evaluated in cutting operations such as turning, threading, and end-milling, often with machining conditions (cutting data) more suitable for physical vapor deposition (PVD)- than CVD-coated tools. Some results are presented in this paper. It has been shown that the addition of a 2-mum-thick gamma-Al2O3 layer decreases the wear rate. The gamma-Al2O3/TiAlN (TiN)-coated inserts exhibit tool lives longer than the single-coated inserts especially at higher cutting speeds. (C) 2004 Published by Elsevier B.V.
机译:随着双极脉冲双磁控溅射(BP-DMS)技术的引入,为绝缘层(如Al2O3)以及导电化合物层(如TiAl1-xN)的沉积开辟了广泛的机会。在BP-DMS中,成对的两个磁控管交替充当阴极和阳极。在阴极阶段,靶被溅射清洗,从而确保了阳极阶段的金属表面和稳定的长期运行。在足够高的频率(25-50 kHz)下,绝缘层可能的电子充电将受到抑制,否则会限制电弧放电的麻烦现象。 BP-DMS方法使得可以在低至700摄氏度的衬底温度下沉积[440]方向织构的坚硬(大于或等于2000 HV)纳米晶体γ-A(2)O(3)。与传统的化学气相沉积(CVD)温度(1000-1050摄氏度)相比,Al2O3多晶型物α和kappa的沉积温度要低得多。本文在记录过程特征数据和评估方面进行了研究已经完成了磁场的影响。对于一组参数,硬质合金切削刀片已经过涂层和测试。已经在切削加工(例如车削,螺纹加工和端铣)中评估了具有双层gamma-Al2O3和TiAIN或TiN的刀片,并且通常在比CVD更适合物理气相沉积(PVD)的加工条件(切削数据)下进行评估涂层的工具。本文提出了一些结果。已经表明,添加2μm厚的γ-Al2 O 3层降低了磨损率。带有γ-Al2O3/ TiAlN(TiN)涂层的刀片比单涂层刀片具有更长的刀具寿命,尤其是在更高的切削速度下。 (C)2004由Elsevier B.V.发布

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