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A combination process of magnetorheological finishing and computer controlled optical surfacing on single-crystal silicon surface

机译:单晶硅表面上磁流学精加工和计算机控制光学衬底的组合过程

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The combination process of Magnetorheological finishing (MRF) and Computer controlled optical surfacing(CCOS) are adopted to overcome the drawback of traditional polishing method in final finishing of single-crystal silicon and the deterioration of the surface roughness of single-crystal silicon by Magnetorheological finishing. In order to meet the requirements of single-crystal silicon by magnetorheological finishing, a new magnetorheological finishing fluid is prepared and orthogonal process parameters experiments are designed to optimize the magnetorheological finishing parameters. Through the uniform finishing experiment of MRF and CCOS, the processing sequence conditions of the combined process are obtained. A single-crystal silicon mirror with diameter of 100 mm is finished with several iterations of MRF and CCOS, the surface roughness Ra reaches 0.7 nm which verified the prepared magnetorheological finishing fluid and the optimized parameters satisfied the Finishing requirements of the single-crystal silicon surface. The results prove that the combination of MRF and CCOS process has unique advantages in the final finishing of single-crystal silicon.
机译:采用磁流学精加工(MRF)和计算机控制光学表面(CCO)的组合过程来克服单晶硅的最终精加工中传统抛光方法的缺点,并通过磁流学精加工造成单晶硅表面粗糙度的劣化。为了通过磁流变精加工满足单晶硅的要求,制备了一种新的磁流变精加工,并且正交过程参数实验旨在优化磁流学整理参数。通过MRF和CCO的均匀精加工实验,获得了组合过程的加工序列条件。具有直径为100mm的单晶硅镜,完成了MRF和CCO的几次迭代,表面粗糙度Ra达到0.7nm,验证了制备的磁流学精加工流体,优化参数满足单晶硅表面的精加工要求。结果证明,MRF和CCOS工艺的组合在单晶硅的最终精加工中具有独特的优势。

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