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Structural, magnetic, and transport properties of (Zn,V)Te semiconductors

机译:(Zn,V)TE半导体的结构,磁性和传输性能

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Vanadium-doped ZnTe has been predicted to be one of the candidates for ferromagnetic semiconductors with a high Curie temperature [K. Sato and H. Katayama-Yoshida, Semicond. Sci. Technol. 17, 367 (2002)]. In this paper, we report the structural, magnetic, and transport properties of (Zn,V)Te films prepared by magnetron sputtering. Samples were fabricated on both GaAs and thermally oxidized silicon substrate at elevated temperature. Oriented sample (100) can be achieved on GaAs substrates and only polycrystalline samples are observed on Si substrates. X-ray diffraction (XRD) and transmission electron spectroscopy (TEM) show no magnetic precipitates in the (Zn,V)Te film. The magnetization measurement shows that the oriented sample is paramagnetic at 5 K, while films on Si substrate shows weak ferromagnetism at 5 K. The sign of magnetoresistance (MR=[R(H)-R(0)]/R(0)) gradually changes from negative to positive with temperature, and positive MR at high temperatures shows H~2 dependence, indicating ordinary MR effect. It is believed the observed negative MR corresponds to the ferromagnetic ordering at lower temperature.
机译:已经预测钒掺杂的ZnTe是具有高居里温度的铁磁半导体的候选者之一[K。 Sato和H. Katayama-yoshida,Semicond。 SCI。技术。 17,367(2002)]。在本文中,我们报道了通过磁控溅射制备的(Zn,V)Te膜的结构,磁性和传输性质。在高温下在GaAs和热氧化硅衬底上制造样品。在GaAs底物上可以实现取向的样品(100),并且在Si衬底上仅观察到多晶样品。 X射线衍射(XRD)和透射电子光谱(TEM)显示(Zn,V)TE膜中没有磁性沉淀物。磁化测量表明,取向的样品在5 k处是顺磁性,而Si底物上的薄膜显示在5k下的弱铁磁性。磁阻的符号(MR = [R(H)-R(0)] / R(0))逐渐从阴性变为阳性,温度为阳性,​​高温正MR显示H〜2依赖性,表明普通的MR效应。认为观察到的负MR对应于较低温度下的铁磁性排序。

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