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Magnetic force microscopy study of magnetic stripe domains in sputter deposited Permalloy thin films

机译:溅射沉积型渗透薄膜磁条畴的磁力显微镜研究

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A magnetic force microscopy based study on the formation of stripe domains in Permalloy (Ni_(80)Fe_(20)) thin films is presented. Our results show that the critical thickness for stripe domain initiation depended on the sputtering rate, the substrate temperature, and the film thickness. Beyond the stripe domain formation, an increase of the period of a highly ordered array of stripe domains was evident with increasing film thickness. Thin films sputtered at room temperature with thickness variation between approx 80 and approx 350 nm exhibited square-root growth dependency on stripe domains periodicity from approx 150 to approx 380 nm, respectively. Above a certain thickness, the domain period decreased and the periodicity deteriorated with the array becoming more random, which is a strong indicator of relatively high structural perpendicular anisotropy. To illustrate, Permalloy sputtered at 100 deg C initially showed linear dependence in stripe domain periodicity growth up until approx 650 nm thick films. The magnetic stripe domain structure began breaking down for thicker Permalloy films. Our data also suggested that the perpendicular anisotropy responsible for the formation of stripe domains might have resulted from strain-caused magnetostriction and the thin-film microstructure shape effect.
机译:介绍了基于磁力显微镜的基于渗透合金中的条纹结构域的研究(Ni_(80)Fe_(20))薄膜。我们的结果表明,条纹域发动的临界厚度取决于溅射速率,基板温度和膜厚度。除了条纹畴形成之外,随着薄膜厚度的增加,高度有序的条纹域的周期的增加是显而易见的。在室温下溅射的薄膜在约80和约350nm之间的厚度变化,分别显示出平方根生长依赖性,分别从大约150到约380nm的条纹域周期性。在一定的厚度之上,域周期降低,并且周期性与阵列劣化变得更随机,这是相对高的结构垂直各向异性的强指标。为了说明,在100℃下溅射的百合组最初显示在条纹域周期生长中的线性依赖性直至大约650nm厚的薄膜。磁条畴结构开始断开厚度渗透合金薄膜。我们的数据还表明,负责形成条纹结构域的垂直各向异性可能由应变导致的磁致伸缩和薄膜微观结构形状效应产生。

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