DECOMPOSITION AND OXIDATION OF CYCLOPENTASILANE

摘要

Cyclopentasilane has been proved to be an effective precursor to prepare thin silicon films which is intended be applied in new solar cell manufacturing techniques at ambient pressure, and might be also used in propulsion technologies. However, it is pyrophoric, therefore decomposition and reactions with oxygen have to be carefully investigated to establish the deposition process and safe handling. Methods of thermal analysis and evolved gas analysis by FTIR in a heatable IR-cell record the behavior cyclopentasilane. The IR- bands indicate the appearance of a-Si:H, Si/SiO2 and polysilane on decomposing cyclopentasilane without solvents. The reaction forms particles in the gas phase with sizes between 0.2 and 1.3 μm. High pressure injection of the cyclopentasilane gives consolidated Si thin films on various surfaces.