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NANOCOMPOSITE MO-CU-N COATINGS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING PROCESS WITH A SINGLE ALLOYING TARGET

机译:通过具有单个合金化靶的反应磁控溅射工艺沉积纳米复合材料Mo-Cu-n涂层

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In this study, it has been tried to make the single Mo-Cu alloying targets with the Cu content showing the best surface hardness that was determined by investigation on the coatings with the Mo and Cu double target process. The single alloying targets were prepared by powder metallurgy methods such as mechanical alloying and spark plasma sintering. Subsequently, the nanocomposite coatings were prepared by reactive magnetron sputtering process with the single alloying targets in Ar+N_2 atmosphere. The microstructure changes of the coatings were investigated by using XRD, SEM and EDS and TEM. The mechanical properties of Mo-Cu-N coatings were evaluated by using nanoindentor. In this study, the nano-composite MoN-Cu coatings prepared using an alloying target was eventually compared with the coatings from the multiple targets.
机译:在该研究中,已经尝试使单一的Mo-Cu合金化靶标具有Cu含量,所述Cu含量显示通过用Mo和Cu双靶法研究通过对涂层进行研究来确定的最佳表面硬度。通过粉末冶金方法如机械合金化和火花等离子体烧结制备单个合金化靶。随后,通过在Ar + N_2大气中的单个合金靶标,通过反应磁控溅射工艺制备纳米复合涂层。使用XRD,SEM和EDS和TEM研究涂层的微观结构变化。通过使用纳米管门评估Mo-Cu-N涂层的机械性能。在该研究中,使用合金化靶制备的纳米复合MON-Cu涂层与来自多个靶标的涂层相比,使用合金化靶制备。

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