首页> 外国专利> Coating device for depositing layers of alloys, mixtures or reaction products of different materials by magnetron sputtering has a target made from concentrically arranged partial targets each made from the material to be deposited

Coating device for depositing layers of alloys, mixtures or reaction products of different materials by magnetron sputtering has a target made from concentrically arranged partial targets each made from the material to be deposited

机译:用于通过磁控溅射沉积不同材料的合金,混合物或不同产物的反应层的涂覆装置具有由同心布置的局部靶材制成的靶材,每个靶材均由待沉积材料制成

摘要

Coating device comprises a target and a unit producing a magnetic field. The target is made from two concentrically arranged partial targets (1, 2) each made from the material to be deposited. Separating lines run between the partial targets parallel to the pole lines of the unit producing a magnetic field. The partial targets are electrically connected. The unit producing a magnetic field contains electromagnetic coils (3, 4) assigned to the partial targets and has devices which can change the position of the magnetic pole opposite the separating lines of the partial targets.
机译:涂覆装置包括靶和产生磁场的单元。该靶由两个同心布置的局部靶(1、2)制成,每个局部靶都由待沉积的材料制成。分隔线在部分目标之间延伸,平行于产生磁场的单元的极线。部分靶电连接。产生磁场的单元包含分配给部分目标的电磁线圈(3、4),并具有可更改与部分目标的分隔线相对的磁极位置的装置。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号