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Production of Microelectronic Components by Electrophoretic Deposition

机译:电泳沉积生产微电子元件

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Electrophoretic deposition (EPD) is a particle based, electrodynamic forming process suitable for particles in the micron to nanometer size range. Beginning with a 300 nm diameter silver/palladium powder we have used EPD to produce 5 μm wide conductor lines with a 10μm spacing on a dielectric tape. In this process a component is first imaged as a conductive pattern on a plastic film by conventional photolithography. This pattern is then immersed into a stable, dispersed and electrostatically charged suspension of particles. A voltage is applied between the conductive pattern and a counter electrode in the suspension, causing a current flow through the suspension, and attracting particles to the conductive pattern. The current creates an electro-chemical environment at the surface which causes the particles to deposit onto the pattern. This deposition can range from a monolayer to many thousands of particles thick. Using a binder, these deposited particles can then be transferred to another surface to be sintered or fused forming continuous lines or layers. The photolithographically produced conductor pattern can be re-used repeatedly to create more depositions. In this manner a single pattern produced by photolithography can be used to make multiple parts with photolithographic scale resolution.
机译:电泳沉积(EPD)是一种基于颗粒的电动形成工艺,适用于微米到纳米尺寸范围的颗粒。从300nm直径的银/钯粉末开始,我们使用EPD在介电带上产生5μm宽导体线,在介电带上具有10μm间距。在该过程中,首先将组分成像作为常规光刻膜上的导电图案。然后将该图形浸入稳定,分散和静电的颗粒的悬浮液中。在悬架中的导电图案和对电极之间施加电压,导致电流流过悬架,并将颗粒吸引到导电图案。电流在表面上产生电化学环境,使颗粒沉积在图案上。该沉积可以从单层到数千个颗粒的厚。使用粘合剂,然后可以将这些沉积的颗粒转移到待烧结或熔融形成连续线或层的另一表面。光刻产生的导体图案可以重复地重复使用以产生更多的沉积。以这种方式,通过光刻产生的单个图案可用于使具有光刻刻度分辨率的多个部件。

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