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Optical Absorption Characteristics of Cu-Ga-Se Thin Films Grown by Molecular Beam Deposition Method

机译:分子束沉积法生长Cu-Ga-SE薄膜的光学吸收特性

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Energy band gap and excitonic energy of high quality Cu-Ga-Se thin films with Cu/Ga-ratio ranging from 1.45 to 0.70 were determined by means of optical absorption measurement in the wavelength range 500 to 1500 nm at room temperature. The Cu-Ga-Se thin films were prepared by molecular beam deposition (MBD) method with 2-stage growth process onto soda-lime glass as well as Mo coated soda-lime glass substrate. During the growth process, power of the substrate heater and pyrometric detection of the Cu-Ga-Se surface temperature were monitored simultaneously. The Cu-Ga-Se thin firms with the thickness of 1.4-2.4 μm corresponding to Cu/Ga-ratio from 1.45 to 0.70 can be obtained with high precision. The optical transmittance and reflectance measurements were used to observe the optical absorption characteristics of the Cu-Ga-Se films from the Cu-rich (Cu/Ga=1.45) to the Cu-poor (Cu/Ga=0.70) composition. All optical absorption spectra (ranging from 600 to 800 nm) of the Cu-Ga-Se thin films were fit including excitonic absorption at room temperature. The free excitonic resonance energy of 1.689 eV and fundamental energy band gap of 1.696 eV were obtained at room temperature. Both energy band gap and free excitonic resonance energy of the Cu-Ga-Se thin films were found to be no significantly change with Cu/Ga-ratio from 1.45 to 0.70. The amount of free exciton was slightly decreased with decreasing of Cu/Ga-ratio. The results indicated that the Cu-Ga-Se polycrystalline thin films with excitonic grade could be fabricated by MBD method.
机译:通过在室温下波长范围为500至1500nm的光学吸收测量,通过光学吸收测量测定的高质量Cu-ga-Se薄膜的能带隙和高质量Cu-ga-Se薄膜的胶片能量。通过分子束沉积(MBD)方法制备Cu-Ga-Se薄膜,其在钠钙玻璃以及Mo涂覆的钠钙玻璃基板上。在生长过程中,同时监测基板加热器的功率和Cu-Ga-Se表面温度的高温检测。厚度为1.4-2.4μm的Cu-Ga-Se薄型,可高精度地获得1.45至0.70的Cu / Ga比。光学透射率和反射率测量用于观察来自富含Cu-Ga-Se膜的Cu-Ga-Se膜的光学吸收特性,所述Cu-Ga-Se膜与Cu差(Cu / Ga = 0.70)组合物。 Cu-Ga-Se薄膜的所有光学吸收光谱(范围为600至800nm)适合在室温下包括激发器吸收。在室温下获得1.689eV和1.696eV的基本能源带隙的自由激发振荡能量。发现Cu-Ga-Se薄膜的能带隙和自由兴奋性共振能量与1.45至0.70的Cu / Ga比没有显着变化。随着Cu / Ga比的降低,自由激子的量略微降低。结果表明,通过MBD方法制造具有激发器等级的Cu-Ga-Se多晶薄膜。

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