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Preparation and Characterization of Nanocrystalline Noble Metal Films by MOCVD

机译:MOCVD的纳米晶贵金属膜的制备与表征

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Noble metals such as palladium, platinum, iridium and ruthenium were prepared in ah horizontal hot-wall MOCVD apparatus using metal-acetylacetonates as precursors. A wide range of deposition conditions (T_(dep)=250-800°C and P_(total)=0.1-500 Torr) was explored and the effects on the features of the films were investigated. Structural and morphological characteristics were found to be very sensitive to those conditions. By the use of appropriate conditions and reactive gas (H_2 or O_2), high-purity, dense and oriented films were obtained. On the other hand, films consisted of agglomerated nanocrystalline particles of pure metals or metal oxides were also possible to obtain. The size of nanoparticles varied from 15 to 100 nm depending on deposition conditions. The nanocrystalline nature of films was used for applications requiring large surface area such as electrocatalysts for electrochemical reactions of technological interest. Nanocrystalline platinum films prepared by MOCVD exhibited superior electrocatalitic activity than platinum electrocatalysts prepared by conventional methods in the hydrogen evolution reaction. In addition, iridium-ruthenium oxide films showed to be very promising for the oxygen evolution reaction.
机译:使用金属 - 乙酰丙酮作为前体,在AH水平热壁MOCVD装置中制备贵金属如钯,铂,铱和钌。探讨了各种沉积条件(T_(DEP)= 250-800°C和P_(总计)= 0.1-500托),研究了对薄膜特征的影响。发现结构和形态特征对这些条件非常敏感。通过使用适当的条件和反应性气体(H_2或O_2),获得高纯度,致密和定向的薄膜。另一方面,还可以获得由纯金属或金属氧化物的附聚纳米晶体颗粒组成的薄膜。根据沉积条件,纳米颗粒的尺寸从15至100nm变化。薄膜的纳米晶体性质用于需要大表面积的诸如电催化剂的电化学反应的电化学反应。通过MOCVD制备的纳米晶铂薄膜表现出优异的电催化活性,其常规方法在氢进化反应中制备的铂电催化剂。此外,氧化铱 - 氧化钌膜显示出对氧气进化反应非常有前途。

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