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Proposal for a distributed parallel system for high throughput maskless e-beam lithography

机译:用于高吞吐量掩模电子束光刻的分布式并行系统的提案

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An experimental test stand was constructed and operated at Stanford University. It utilizes the uniform magnetic field of a solenoid to effect the imaging of an electron source onto a high resolution test target. Colloidal gold spheres of 30 nm diameter were just resolved. This result is of sufficient interest to warrant further research on this concept, including demonstration of high resolution and fine line lithography using multiple beams. The concept has the possibilty for a maskless e-beam lithography system with throughput significantly higher than any direct write e-beam system to date.
机译:在斯坦福大学建造并运营了一个实验试验台。它利用螺线管的均匀磁场来实现电子源的成像到高分辨率测试靶标。直径为30nm的胶体金球刚刚得到解决。这一结果有足够的兴趣,令您进一步研究这一概念,包括使用多个光束的高分辨率和细线光刻的演示。该概念对迄今为止的吞吐量显着高于任何直接写电子束系统,该概念具有吞吐量的掩模电子束光刻系统。

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