首页> 外文会议>IEEE International Conference on Micro Electro Mechanical Systems >Microfabrication of 3-dimensional photoresist structures using selective patterning and development on two types of specific resists and its application to microfluidic components
【24h】

Microfabrication of 3-dimensional photoresist structures using selective patterning and development on two types of specific resists and its application to microfluidic components

机译:三维光致抗蚀剂结构的微细加工使用选择性图案化和在两种特异性抗蚀剂上的开发及其在微流体组分中的应用

获取原文

摘要

This paper reports a new technology for the formation of various 3-dimensional positive photoresist structures with simple photolithography by using UV-insensitive sacrificial photoresist and its selective development in specific developer solution with combination of multi-exposure and single development technique. We have successfully implemented various 3-dimensional photoresist structures including recessed cantilevers, suspended bridges and complex plates with micro-pits or micro-villi, which are utilized as micro master molds for PDMS microfluidic components.
机译:本文通过使用紫外线不敏感的牺牲光致抗蚀剂及其在多曝光和单一显影技术的组合,通过使用紫外线不敏感牺牲光致抗蚀剂和其在特定显影剂溶液中的选择性发育来形成各种三维正光刻胶结构的新技术。我们已经成功地实现了各种三维光致抗蚀剂结构,包括凹陷的悬臂,悬浮桥和具有微坑或微绒毛的复合板,其用作PDMS微流体组分的微母模具。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号