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Enhancement of the photoconductivity in 2D photonic macroporous silicon structures

机译:2D光子大孔硅结构中的光电导性的提高

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Effects of the enhancement of photoconductivity in 2D photonic macroporous silicon structures were investigated. Dependence of photoconductivity on the angle of incidence of the electromagnetic radiation is observed with maxima at normal incidence of electromagnetic radiation, in the region of the angle of full internal reflection respective to macropore walls and at a grazing angle of incidence respective to the surface of structure. The absolute maximum of photoconductivity is measured at distance between macropores, corresponding to two lengths of the electron free run, i.e. by the maximal transfer of the amplified electric components from a macropore surface in a silicon matrix. Angular dependences of photoconductivity, as well as enhancement of the photoconductivity in comparison with monocrystal silicon, primary absorption p-component of electromagnetic radiation testified to formation of surface electromagnetic waves in illuminated macrporous silicon structures. Its effects result in amplification of a local electric field on a surface of macroporous silicon structure and a macropore surface. The measured value of the built-in electric field on a macropore surface achieves 10~6 V/cm, the signal of photoconductivity amplifies 10~2 times, and Raman scattering - up to one order of value.
机译:研究了第2D光子大孔硅结构中的光电导性提高的影响。在电磁辐射的正常发生率下,在电磁辐射的正常发生率下观察光电导性对电磁辐射的发生率的依赖性,在相应于大孔壁的完全内反射角度的区域中,并以相应于结构的表面的射击入射角的区域。在大孔之间的距离之间测量光电导性的绝对最大值,对应于两个长度的无电子运行,即通过在硅基矩阵中的大孔表面的扩增电气分量的最大转移。光电导性的角度依赖性,以及与单晶硅相比的光电导性的提高,电磁辐射的主要吸收p组分在照射的宏观硅结构中形成表面电磁波的形成。其影响导致大孔硅结构表面和大孔表面上的局部电场扩增。 Macropore表面上的内置电场的测量值实现了10〜6 V / cm,光电导性的信号放大10〜2次,拉曼散射 - 最多一个值。

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