首页> 外国专利> MANUFACTURING METHOD OF 2D AMORPHOUS PHOTONIC CRYSTAL STRUCTURE AND THE 2D AMORPHOUS PHOTONIC CRYSTAL STRUCTURE

MANUFACTURING METHOD OF 2D AMORPHOUS PHOTONIC CRYSTAL STRUCTURE AND THE 2D AMORPHOUS PHOTONIC CRYSTAL STRUCTURE

机译:二维非均匀光子晶体结构的制造方法

摘要

In the method for manufacturing the two-dimensional amorphous photonic crystal structure of the present invention and in the two-dimensional amorphous photonic crystal structure produced thereby, the method for manufacturing the two-dimensional amorphous photonic crystal structure of the present invention has at least one hole and has a liquid by capillary action. Placing an absorbable wicking pad on the substrate; Applying a dispersion liquid containing magnetoplasmic nanoparticles on the substrate while forming a magnetic field under the substrate; And drying the applied dispersion.
机译:在本发明的二维非晶光子晶体结构的制造方法中以及在由此制造的二维非晶光子晶体结构中,本发明的二维非晶光子晶体结构的制造方法具有至少一个。孔并通过毛细作用具有液体。将可吸收的芯吸垫放在基材上;在基板上形成磁场的同时,在基板上施加含有磁质纳米粒子的分散液。并干燥所施加的分散体。

著录项

  • 公开/公告号KR1021239480000B1

    专利类型

  • 公开/公告日2020-06-17

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR1020190010849

  • 发明设计人 이재범;짠반딴;김정효;오상진;

    申请日2019-01-29

  • 分类号

  • 国家 KR

  • 入库时间 2022-08-21 10:59:02

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