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Characterization of Gadolinium oxide thin films deposited under low ambient substrate temperature using Phase Modulated Spectroscopic Ellipsometry

机译:使用相位调节光谱椭圆形测定法在低环境衬底温度下沉积的氧化钆薄膜的表征

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Advanced vacuum deposition methods and accurate determination of optical constants for thin films are highly essential in developing multilayer thin film optical devices for various laser and spectroscopic related applications. This work presents some ellipsometric characterization and analysis results on Gadolinium Oxide, a novel wide band-gap ultraviolet transmitting optical material. Using reactive electron beam evaporation technique, several samples of gadolinium oxide have been prepared at different oxygen partial pressures and rates of deposition. Then accurate information about optical constants of these films has been derived from phase modulated spectroscopic ellipsometric measurements along with a realistic physical model. It has been observed that oxygen pressure and rate of evaporation have strong influences on optical constants of these thin films. It has also been observed that samples prepared at ambient substrate conditions found to give higher band gaps, which makes this material as a potential candidate of developing multilayer UV optical coatings.
机译:高级真空沉积方法和精确测定薄膜的光学常数在开发用于各种激光和光谱相关应用的多层薄膜光学装置方面是高必需的。这项工作提出了一些椭圆形表征和分析结果对氧化钆,一种新型宽带间隙紫外线透射光学材料。利用反应性电子束蒸发技术,已经在不同的氧气部分压力和沉积速率下制备了几种氧化钆样品。然后,关于这些薄膜的光学常数的准确信息已经来自相位调制的光谱椭圆形测量测量和现实的物理模型。已经观察到,氧气压力和蒸发速率对这些薄膜的光学常数具有很强的影响。还观察到,在环境底物条件下制备的样品发现给予更高的带间隙,这使得这种材料作为显影多层UV光学涂层的潜在候选者。

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