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Characterization of inhomogeneous transparent thin films on transparent substrates by spectroscopic ellipsometry.

机译:椭圆偏振光谱法表征透明基材上的不均匀透明薄膜。

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摘要

Inhomogeneities in dielectric thin films are known to be responsible for the observed irreproducibilities in the film properties. Therefore any reliable method for determining the true optical properties of the film material must take into account the serious perturbing effects of the film inhomogeneity. Spectroscopic ellipsometry (SE) has been used as a nondestructive technique for determining the optical properties of metallic and semiconducting thin films and materials. Unfortunately, when similar measurements on a dielectric material or film are made, SE suffers a serious drawback due to the lack of sensitivity inherent in the basic design of the instrument. To solve this problem, in this thesis, a novel method of incorporating an achromatic compensator into a rotating-analyzer type SE is proposed and tested. For the first time, the refractive index (n) of vitreous silica measured by SE matches the reference data to within 0.001 over a wide spectral range (300-700 nm). More importantly, the sensitivity of SE to the extinction coefficient (k) can also be estimated to the third decimal place.; Using this new measurement method and linear regression analyses procedures for interpreting the SE data, a number of optical thin films deposited on vitreous silica substrates were characterized successfully. All the films studied show inhomogeneities such as surface microroughness, incorporated voids and nonuniform distribution of voids. Quantitative results simultaneously obtained include the refractive index as a function of wavelength, the thickness as well as the void fraction of each optical sublayer. As a result, the true refractive index of the film material, unperturbed by the effect of the film structural inhomogeneity, is reported for several optical coating materials (AlF{dollar}sb3{dollar}, CeF{dollar}sb3{dollar}, HfF{dollar}sb4{dollar}, LaF{dollar}sb3{dollar}, ScF{dollar}sb3{dollar}, Al{dollar}sb2{dollar}O{dollar}sb3{dollar}, ThO{dollar}sb2{dollar}, HfO{dollar}sb2{dollar}, Sc{dollar}sb2{dollar}O{dollar}sb3{dollar}, Y{dollar}sb2{dollar}O{dollar}sb3{dollar} and ZrO{dollar}sb2{dollar}) in the near UV and visible region. Additionally, the power of SE with an achromatic compensator has been demonstrated by successful depth profiling the inhomogeneities in BaTiO{dollar}sb3{dollar} thin films on single crystal SrTiO{dollar}sb3{dollar} substrates.
机译:已知介电薄膜中的不均匀性是造成所观察到的薄膜性能不可再现性的原因。因此,用于确定膜材料的真实光学性质的任何可靠方法都必须考虑到膜不均匀性的严重干扰作用。椭圆偏振光谱法(SE)已被用作确定金属和半导体薄膜及材料的光学特性的非破坏性技术。不幸的是,当在介电材料或薄膜上进行类似的测量时,由于仪器基本设计固有的灵敏度不足,SE遭受了严重的缺点。为了解决这个问题,本文提出并测试了一种将消色差补偿器结合到SE型旋转分析仪中的新方法。通过SE测得的氧化硅玻璃的折射率(n)首次在宽光谱范围(300-700 nm)内将参考数据与0.001相匹配。更重要的是,SE对消光系数(k)的敏感性也可以估计到小数点后三位。使用这种新的测量方法和用于解释SE数据的线性回归分析程序,成功地表征了沉积在玻璃石英基板上的许多光学薄膜。所有研究的薄膜均显示出不均匀性,例如表面微粗糙度,引入的空隙和空隙的不均匀分布。同时获得的定量结果包括折射率随波长的变化,每个光学子层的厚度以及空隙率。结果,对于几种光学涂层材料(AlF {dollar} sb3 {dollar},CeF {dollar} sb3 {dollar},HfF)报道了不受膜结构不均匀性影响的膜材料的真实折射率{dollar} sb4 {dollar},LaF {dollar} sb3 {dollar},ScF {dollar} sb3 {dollar},Al {dollar} sb2 {dollar} O {dollar} sb3 {dollar},ThO {dollar} sb2 {dollar },HfO {dollar} sb2 {dollar},Sc {dollar} sb2 {dollar} O {dollar} sb3 {dollar},Y {dollar} sb2 {dollar} O {dollar} sb3 {dollar}和ZrO {dollar} sb2 {dollar})在紫外线和可见光区域附近。此外,通过成功地对SrTiO {dollar} sb3 {dollar}单晶衬底上的BaTiO {sb3 {dollar}薄膜中的不均匀性进行深度剖析,可以证明SE具有消色差补偿器的功能。

著录项

  • 作者

    Chindaudom, Pongpan.;

  • 作者单位

    The Pennsylvania State University.;

  • 授予单位 The Pennsylvania State University.;
  • 学科 Physics Condensed Matter.; Physics Optics.
  • 学位 Ph.D.
  • 年度 1991
  • 页码 236 p.
  • 总页数 236
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 光学;
  • 关键词

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