Optical properties of thin PLZT films of various stoichiometry are determined using reflectance spectra processing. The knowledge of optical properties of PLZT thin films is quite necessary for opto-electronic applications. Materials like PLZT are attractive for the application in integrated optics and for realisation of various microelectronic and opto-electronic devices. Their optical properties are strongly dependent on deposition conditions and defects concentration. Thin PLZT films are prepared by pulsed laser deposition on sapphire substrates at different oxygen pressure. Film structure is investigated by WDX. Changes of film refractive index n(λ), extinction k(λ) -with wavelength in the spectral region 0.3 - 1.1 μm and film thickness d are determined as a result of films reflectance spectra modeling and fitting procedure using all points of the spectra.
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