Localized formation of nanostructured surfaces using an atmospheric pressure micro-afterglow discharge

摘要

Plasma-assisted nanofabrication is one of the emerging fields used for the production of various nanostructured materials, nanostructures and elements of nanodevices. In this work, we present results obtained from an atmospheric pressure Ar - O_2 micro-afterglow operating at high temperature. Deposition of silicon oxide thin films has been tested by interaction with an organosilicon compound. Different morphologies can be obtained locally: "nest-like" structures, self-organized nanodots or SiO_x hexagonal walls. The possibility to realize direct synthesis of metal oxide nanostructures has also been studied. This approach is based on the exposure of thin metal samples (iron, copper, aluminium) to the micro-afterglow discharge, which leads to the formation of various nanostructures (nanowires, nanodots ...) in a single step of treatment. Under specific conditions, silica nanowires grow on metal films deposited on silicon substrate.