An In-Situ Reflectance Implementation for High Volume Electronic Device Epitaxial Wafer Production

摘要

Smart phones require increasingly complex epi-wafer device structures. A production in-situ data collection and analysis capability is of central importance for yield and quality continuous improvement. An IT solution for implementation of in-situ reflectance into an existing epi wafer manufacturing system is presented. In-situ data plots generated by successful implementation of this IT solution are presented. In particular, production epi wafer growth rate and temperature data by run, by wafer, and on-wafer uniformity are presented.