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A CONTROL DEVICE A BEAM STRUCTURE OF CHARGED PARTICLES

机译:控制装置是带电粒子的光束结构

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For maintenance repeatability technological of ion processing, it is necessary to support density of ion current and distribution density of ion current by constants. For this purpose the control device of ion sources with a wide beam has been developed. In this work the device for exact reproduction structure of a beam negatively or positively charged particles, is described. Calculation mistakes of measurement currents for the given device are resulted.
机译:对于离子处理的维持重复性技术,必须通过常数支持离子电流和离子电流分布密度的密度。为此目的,已经开发了具有宽光束的离子源的控制装置。在该工作中,描述了用于消极或带正电粒子的光束的精确再现结构的装置。指导了给定设备的测量电流的计算错误。

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