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Optical properties of InGaN/GaN and AlGaN/GaN multiple quantum well structures

机译:Ingan / GaN和AlGaN / GaN多量子阱结构的光学性质

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We report on low temperature photoluminescence (PL) in In_xGa_(1-x)N multiple quantum wells (MQWs) with x in the range 0.1 and highly Si doped barriers of In_(0.01)Ga_(0.99)N. One sample with 3 QWs of width 3.5 nm and barriers of width 10.5 nm had the MQW in the depletion region of the outer surface. Two PL peaks were observed, one QW exciton from the QW closest to the GaN buffer, one lower energy peak related to a 2DEG at the interface to the GaN buffer layer. In a second similar sample 5 QWs of width 3 nm and with 6 nm highly Si doped In_(0.01)Ga_(0.99)N barriers the MQW was placed in the n-side depletion region of a pn-junction. At low temperatures the PL and electroluminescence (EL) spectra are quite different at no, low, or reverse bias, the PL appearing at higher energy. At high forward bias a spectral component at the EL position appears. This proves a strong influence of the depletion field on the optical spectra. Preliminary results are also reported for n-doped Al_(0.07)Ga_(0.93)N/GaN structures, with near surface MQWs.
机译:我们在in_xga_(1-x)n多量子孔(MQW)中的低温光致发光(PL)报告在0.1范围内的x和IN_(0.01)GA_(0.99)N的高度SI掺杂屏障中。一个具有3 QW的宽度3.5nm和宽度屏障的样品10.5nm在外表面的耗尽区域中具有MQW。观察到两个PL峰值,一个QW激子从最接近GaN缓冲器的QW,一个较低的能量峰与2deg在接口到GaN缓冲层。在第二相似的样品5宽3nm和6nm高度Si掺杂的In_(0.01)Ga_(0.99)n屏障中,将MQW放置在Pn结的N侧耗尽区域中。在低温下,PL和电致发光(EL)光谱在较高的能量下出现的PL处于NO,低或反向偏置。在高正向偏置处,出现EL位置处的光谱分量。这证明了耗尽场对光谱的强烈影响。还报告了N-掺杂Al_(0.07)Ga_(0.93)N / GaN结构的初步结果,附近的表面MQWS。

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