首页> 外文会议>Annual Pan Pacific microelectronics symposium >X-RAY INSPECTION FOR MICROELECTRONICS LATEST DEVELOPMENTS
【24h】

X-RAY INSPECTION FOR MICROELECTRONICS LATEST DEVELOPMENTS

机译:微电子学最新发展的X射线检测

获取原文
获取外文期刊封面目录资料

摘要

During the past few years X-ray Test and Inspection has become a major part in the Quality control of Microelectronics and Semiconductor Industry. Advances both in X-ray tube technology and in X-ray detector technology have been made. Radioscopy has expanded and has established in many new fields that require quality control or process optimization. First nanofocus and multifocus X-ray systems have become available with a focus spot of .5 micron. In the existing range of micro focus X-ray tubes further improvements have been achieved as well, like increased long term stability of intensity position constancy. This presentation illustrates numerous examples and applications where new X-ray components have been beneficially used in the Failure Analysis and Process Control of Microelectronics, Semiconductor components and PCB's.
机译:在过去的几年里,X射线测试和检查已​​成为微电子和半导体行业质量控制的主要部分。已经进行了X射线管技术和X射线探测器技术的进步。放射镜检查已经扩展并在许多需要质量控制或过程优化的新领域建立。第一个纳米焦和多焦点X射线系统已成为.5微米的聚焦点。在现有的微聚焦X射线管中,还实现了进一步的改进,如强度位置恒定的长期长期稳定性增加。该呈现说明了许多示例和应用,其中新的X射线分量在微电子,半导体元件和PCB的故障分析和过程控制中有利地使用。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号