SYNTHESIS AND ATOMIC OXYGEN EROSION TESTING OF SPACE-SURVIVABLE POSS (POLYHEDRAL OLIGOMERIC SILSESQUIOXANE) POLYIMIDES

摘要

This paper presents several characterization studies of the surfaces of newly synthesized POSS-containing polyimides before and after exposure to atomic oxygen (AO). AO exposure testing was conducted independently at the University of Florida and Montana State University revealing comparable data. The exposed surfaces were characterized using X-ray photoelectron spectroscopy, and atomic oxygen erosion rates were calculated using stylus surface profilometry. The data indicate that AO induced erosion of polyimides containing POSS is drastically reduced as a result of a passivating silica layer is formed on the surface of the polymer.