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Electrodeposition of soft CoFeCr films with high magnetic saturation and high resistivity

机译:具有高磁饱和度和高电阻率的软囊膜电沉积

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摘要

The electrodeposition and the annealing of CoFeCr alloy were explored. This material was elaborated by pulse plating technique. The evolution of resistivity as a function of the amount of chromium was studied. After a specific annealing treatment, Co_(86)Fe_(12)Cr_2 films exhibit very good soft magnetic properties and high saturation magnetization: H_c < 0.5 Oe, H_k = 20 Oe, μ_(eff) = 700 up to 150 MHz (for 1 μm) and B_s = 1.8 T. Magnetic domains and crystal structure of this alloy were characterized. CoFeCr films were integrated into magnetic devices using conventional micro-technology processes.
机译:探讨了CofeCR合金的电沉积和退火。通过脉冲电镀技术阐述该材料。研究了电阻率的演变作为铬量的函数。特定退火处理后,CO_(86)Fe_(12)CR_2膜表现出非常好的软磁特性和高饱和磁化强度:H_C <0.5 OE,H_K = 20 OE,μ_(EFF)= 700高达150 MHz(对于1 μm)和B_s = 1.8 T.该合金的磁性结构域和晶体结构的特征在于。使用传统的微型技术过程将CofeCOR薄膜集成到磁性设备中。

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