Formation of Time-Dependent Haze on Silicon Wafers

摘要

After the storage of silicon wafers in transport boxes an increase of localized light scatterers (LLS) might be observed upon surface inspection, caused "by chemical processes on the surface. This phenomenon is called time dependent haze (TDH). Different causes for TDH are known, for example organic additives from packaging materials, chemicals for wafer cleaning, an increased humidity or ionic contaminants. Artificial TDH is prepared in order to determine the parameters leading to it. The impact of copper on the generation of haze is considered. Furthermore an extendet model of the TDH formation is proposed.