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Relation between Particle Density and Haze on a Wafer: a New Approach to Measuring Nano-Sized Particles

机译:晶圆上颗粒密度与雾度的关系:一种测量纳米尺寸粒度的新方法

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The deposition of the nano-sized SiO_2 particles on substrates (nitride and silicon) is investigated and the surface density of deposited particles is found to be proportional to the volume particle concentration in the contamination solution. The particle surface density is estimated based on this proportionality. When the particle density on the surface is very big, the light point defect (LPD) signal measured by light scattering instruments does not increase with the particle density deposited. On the contrary, the haze increases proportionally to the particle density deposited on the surface. A model is developed to describe the added haze as a function of the particle size, the particle density on the surface and the refractive index of the particle material. This allows to determine the particle density for sizes smaller than the LPD size limit of the current state-of-the-art light scattering instruments.
机译:研究了纳米大小的SiO_2颗粒对底物(氮化物和硅)的沉积,并且发现沉积颗粒的表面密度与污染溶液中的体积颗粒浓度成比例。基于这种比例估计颗粒表面密度。当表面上的粒子密度非常大,通过光散射器械测量的光点缺陷(LPD)信号不会随沉积的颗粒密度而增加。相反,雾度与沉积在表面上的颗粒密度成比例地增加。开发了一种模型以描述作为粒度的函数的添加雾度,表面上的粒子密度和颗粒材料的折射率。这允许确定小于当前最先进的光散射仪器的LPD尺寸限制的尺寸的粒子密度。

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