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Deposition of LiNbO_(3) waveguide by pulsed-laser deposition

机译:通过脉冲激光沉积沉积LINBO_(3)波导

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LiNbO_(3) thin films were deposited by pulsed-laser deposition (PLD) method. Crystalline and transparent films were deposited on sapphire substrates at 400°C and in 100 mtorr of oxygen gas pressure. The waveguide properties, which were waveguide mode and loss, were measured by prism coupling method. Droplet less film was obtained with low ablation laser fluence and without scanning of ablation laser. The smallest waveguide loss was 32.9 dB/cm at present.
机译:通过脉冲激光沉积(PLD)方法沉积LINBO_(3)薄膜。将结晶和透明膜沉积在400℃并在100毫托的氧气压力下沉积在蓝宝石底物上。通过棱镜耦合方法测量是波导模式和损耗的波导性能。用低烧蚀激光器流量获得液滴较少的薄膜,并且不扫描消融激光器。目前最小的波导损失为32.9dB / cm。

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