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Mask and mask-less injection molded solder (IMS) technology for fine pitch substrate bumping

机译:用于细间距衬底凸起的面罩和较少的注塑模塑焊料(IMS)技术

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We report the results of a new pre-solder bumping technology of injection molded solder (IMS) for fine pitch organic substrates. Pure molten solder is injected through a reusable film mask (mask IMS) or directly injected without a mask (mask-less IMS) on the pads of an organic substrate to overcome the limitation of current pre-solder bumping technologies such as solder paste stencil printing and micro-ball mounting. In the case of mask IMS, targeted solder height over the solder resist (SR) is designed into the mask which has desirable thickness and hole sizes. Three different solder bump heights such as 30, 50, and 70 microns over SR were demonstrated for commercial organic substrates which have a pitch of 150μm for 5,000 area array pads. To show the extendibility of the mask IMS bumping method to very fine pitch applications, 100μm pitch bumping of 10,000 pads and 80μm pitch bumping of 15,000 pads were demonstrated.
机译:我们报告了用于细距有机基材的注射模塑焊料(IMS)的新型预焊料凸块技术的结果。纯熔融焊料通过可重复使用的薄膜掩模(掩模IMS)注入或在有机基板的焊盘上直接注入掩模(较少的掩模IMS),以克服电流预焊料凸块技术的限制,例如焊膏模版印刷和微球安装。在掩模IMS的情况下,焊接抗蚀剂(SR)上的靶标焊料高度被设计成具有所需厚度和孔尺寸的掩模。对于具有150μm的间距,对于5,000个区域阵列焊盘,3种不同的焊料凸块高度,例如30,50和70微米的SR上的SR。为了显示掩模IMS撞击方法到非常细的音调应用的可扩展性,证明了100,000个焊盘的100μm间距凸点和80μm间距凸点为15,000垫。

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