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Electrical properties of polycrystalline and epitaxially grown PZT thin films

机译:多晶和外延生长的PZT薄膜的电性能

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Polycrystalline and epitaxial PZT films with thickness ranging from 30 nm to 350 nm, which have the same (100)-orientation, were prepared by metalorganic chemical vapor deposition (MOCVD). It was confirmed that the epitaxial films had a larger remanent polarization than polycrystalline films. It was also confirmed that the epitaxial films had a lower thickness dependence of the remanent polarization and that the epitaxial films displayed a good hysteresis curve even when the film thickness was less than 100 nm. These experimental data indicate that the crystal quality of the film strongly affects the ferroelectricity of the film.
机译:通过金属有机化学气相沉积(MOCVD)制备具有相同(100)〜350nm的30nm至350nm的多晶和外延PZT薄膜。证实外延膜具有比多晶膜更大的剩余偏振。还证实,外延膜的厚度依赖性较低依赖性,并且即使当膜厚度小于100nm时,外延薄膜也显示出良好的滞后曲线。这些实验数据表明,薄膜的晶体质量强烈影响薄膜的铁电性。

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