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Preparation and Characterization of Copper(II) Oxide Thin Film by Chemical Spray

机译:化学喷雾铜(II)氧化铜薄膜的制备与表征

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Cupric oxide thin films on glass substrate have been prepared by a chemical spray technique using CuCl_2, 2H_2O. X-ray diffraction studies reveal a fine grain polycrystalline structure of the films. Dc electrical conductivity and thermoelectric power has been measured at room temperature and also at elevated temperatures. Hall effect studies show that the films are p-type semiconductors with a low value of the Hall mobility, and have carrier concentration ~10~(15) to ~10~(16) cm~(-3). Variation of the film thickness in a limited range does not have any marked effect on the optical band gap, but the position of the Fermi level is found to depend on the film thickness. In addition to lattice phonon scattering hopping conduction mechanism have been predicted as to have a dominant role in the carrier transport process in these films.
机译:通过使用CuCl_2,2H_2O的化学喷涂技术制备玻璃基板上的氧化铜薄膜。 X射线衍射研究揭示了薄膜的细晶粒多晶结构。在室温下测量DC导电性和热电力也在高温下测量。霍尔效应研究表明,薄膜是P型半导体,霍尔迁移率低,载体浓度〜10〜(15)至〜10〜(16)cm〜(-3)。在有限范围内的膜厚度的变化对光学带隙没有任何明显的影响,但发现费米水平的位置取决于膜厚度。除了晶格声子散射跳跃传导机制,预计在这些薄膜中的载体运输过程中具有主导作用。

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