Influence of substrate temperature on the achievement of Ti-Ni-Zr quasicrystalline films grown by pulsed laser deposition

摘要

Pulsed laser deposition has been used to prepare films in the Ti-Ni-Zr system. Morphology and structure of the obtained films have been studied as a function of substrate temperature being in the range 25-350 °C. Morphological and structural modifications have been followed by grazing incidence and θ - 2θ X-ray diffraction, transmission electron diffraction and imaging. Chemical composition has been analysed by electron probe micro-analysis. The in-depth variation of composition has been studied by secondary neutral mass spectroscopy. This study leads to the determination of the best growth temperature giving rise to the known quasicrystalline phase recently discovered in the Ti-Ni-Zr ternary system.