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Simple approach for modeling photorefractive materials

机译:造型光刷型材料的简单方法

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摘要

We present an RC-model approach for understanding and analysis of holographic storage in photorefractive materials. In this model the resistor, capacitor and the current source are completely defined based on material parameters and light intensities. The model has good accuracy for the practical applications. It can also be used to understand and improve the properties of photorefractive materials for holographic recording. One interesting application of the model is the qualitative analysis of two-center recording. We also discuss this application in detail.
机译:我们提出了一种RC模型方法,用于了解和分析光刷型材料中全息储存。在该型号中,电阻器,电容器和电流源基于材料参数和光强度完全定义。该模型对实际应用具有良好的准确性。它还可以用于理解和改善光刷型材料的特性进行全息记录。该模型的一个有趣的应用是对双中心录音的定性分析。我们还详细讨论了此申请。

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