A NEW APPROACH FOR CMOS FABRICATION OF MICROCANTILEVER/NANOTIP SYSTEMS FOR PROBE-STORAGE APPLICATIONS

摘要

A novel method for fabricating the mechanical part of the "Millipede", a MEMS-based scanning-probe data storage system, is reported. The proposed approach exploits a selective p-to-n HF-based electropolishing step, which allows to remove p-type silicon, used as a sacrificial layer, while leaving n-type silicon, exploited as structural material, un-etched. The approach is CMOS compatible, thus allowing to integrate both the mechanical and electronic part of the "Millipede" on the same chip. Experimental results, carried out on chips fabricated using the BCD6 process of ST Microelectronics, demonstrate the feasibility of fabricating free-standing w-type silicon cantilevers by selective etching of the p-type substrate.